Lithography apparatus having dual reticle edge masking assemblies and method of use
US9081297B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 1, 2012 |
| Grant date | Jul 14, 2015 |
| Priority date | — |
| Expiry date | Mar 28, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70641
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithography apparatus includes at least two reticle edge masking assemblies (REMAs). The lithography apparatus further includes a light source configured to emit a light beam having a wavelength and a beam separating element configured to divide the light beam into more than one collimated light beam. Each REMA is positioned to receive one of the more than one collimating light beams and each REMA comprises a movable slit for passing the one collimated light beam therethrough. The lithography apparatus further includes at least one mask having a pattern, where the at least one mask is configured to receive light from at least one of the REMA and a projection lens configured to receive light from the at least one mask. A method of using a lithography apparatus is also discussed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.