Inventor · Hsinchu, TW

Jui-Chun Peng

26Patents
3h-index
27Co-inventors
59Inventor score

Filing activity: Jun 4, 2009 → Jul 31, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US9841687B2 Synchronized integrated metrology for overlay-shift reduction Physics 27 Active
US8616539B2 Track spin wafer chuck Emerging Cross-Sectional Technologies 4 Active
US9123583B2 Overlay abnormality gating by Z data Physics 3 Active
US9826615B2 EUV collector with orientation to avoid contamination Physics 3 Active
US9658536B2 In-line inspection and clean for immersion lithography Physics 2 Active
US8955530B2 System and method for cleaning a wafer chuck Electricity 1 Active
US10747128B2 Exposure method and exposure apparatus Electricity 1 Active
US9632426B2 In-situ immersion hood cleaning Electricity 1 Active
US9081297B2 Lithography apparatus having dual reticle edge masking assemblies and method of use Physics 1 Active
US8237132B2 Method and apparatus for reducing down time of a lithography system Electricity 1 Active
US9282592B2 Rotatable heating-cooling plate and element in proximity thereto Electricity 0 Active
US10514247B2 Wafer alignment mark scheme Electricity 0 Active
US9978625B2 Semiconductor method and associated apparatus Electricity 0 Active
US9781773B2 Method of heating/cooling a substrate Electricity 0 Active
US11162777B2 Wafer alignment mark scheme Electricity 0 Active
US11500299B2 Exposure method and exposure apparatus Electricity 0 Active
US8338262B2 Dual wavelength exposure method and system for semiconductor device manufacturing Physics 0 Active
US10061215B2 Patterning method and patterning apparatus for fabricating a resist pattern Physics 0 Active
US9863754B2 Wafer alignment mark scheme Electricity 0 Active
US11153957B2 Apparatus and method for generating an electromagnetic radiation Electricity 0 Active
US9640487B2 Wafer alignment mark scheme Electricity 0 Active
US9587929B2 Focus metrology method and photolithography method and system Physics 0 Active
US9709904B2 Lithography apparatus having dual reticle edge masking assemblies and method of use Physics 0 Active
US11768484B2 Semiconductor wafer cooling Electricity 0 Active
US12282318B2 Semiconductor wafer cooling Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.