Patent · US Active

Detection of particle contamination on wafers

US9091667B2 · kind B2 · utility

2Cited by

1References

15Claims

0Family size

Assignee

GlobalFoundries Inc. · KY

Inventors

Adam Michal Urbanowicz · Wrocław, PL
Carsten Hartig · Meerane, DE
Daniel Fischer · Furth, DE

Key dates

Filing date	Oct 25, 2013
Grant date	Jul 28, 2015
Priority date	—
Expiry date	Oct 25, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG01N23/00
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A method of the detection of particle contamination on a semiconductor wafer is provides which includes examining an area of the semiconductor wafer by a metrology system comprising a scatterometry or ellipsometry/reflectometry tool to obtain measured metrology data, comparing the measured metrology data with reference metrology data and determining the presence of particle contamination in the examined area of the semiconductor wafer based on the comparison of the measured metrology data with the reference metrology data.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.