Technique for manufacturing bit patterned media
US9093104B2 · kind B2 · utility
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2References
16Claims
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Key dates
| Filing date | Jan 3, 2012 |
| Grant date | Jul 28, 2015 |
| Priority date | — |
| Expiry date | Oct 1, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/855
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A novel technique for manufacturing bit patterned media is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for manufacturing bit pattern media. The technique, which may be realized as a method comprising: forming a non-catalysis region on a first portion of a catalysis layer; forming a non-magnetic separator on the non-catalysis region; and forming a magnetic active region on a second portion of the catalysis layer adjacent to the first portion of the catalysis layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.