Inventor · North Reading, MA, US

Helen L. Maynard

17Patents
7h-index
35Co-inventors
66Inventor score

Filing activity: May 19, 1995 → Mar 15, 2017

Most-cited inventions

PatentTitleAreaCited byStatus
US6255221A Methods for running a high density plasma etcher to achieve reduced transistor device damage Emerging Cross-Sectional Technologies 329 Expired
US5653894A Active neural network determination of endpoint in a plasma etch process Electricity 44 Expired
US6541149B1 Article comprising micro fuel cell Emerging Cross-Sectional Technologies 39 Expired
US5835221A Process for fabricating a device using polarized light to determine film thickness Physics 38 Expired
US9123509B2 Techniques for plasma processing a substrate Electricity 32 Active
US6228277A Etch endpoint detection Electricity 14 Expired
US6750495B1 Damascene capacitors for integrated circuits Electricity 7 Expired
US8465909B2 Self-aligned masking for solar cell manufacture Emerging Cross-Sectional Technologies 2 Active
US7279426B2 Like integrated circuit devices with different depth Electricity 2 Expired
US8679960B2 Technique for processing a substrate having a non-planar surface Electricity 2 Active
US8124487B2 Method for enhancing tensile stress and source/drain activation using Si:C Electricity 1 Active
US9437432B1 Self-compensating oxide layer Electricity 0 Active
US8431495B2 Stencil mask profile Chemistry; Metallurgy 0 Active
US10460941B2 Plasma doping using a solid dopant source Electricity 0 Active
US8877654B2 Pulsed plasma to affect conformal processing Electricity 0 Active
US9093104B2 Technique for manufacturing bit patterned media Physics 0 Active
US8698106B2 Apparatus for detecting film delamination and a method thereof Physics 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.