Underlayer composition for promoting self assembly and method of making and using

US9093263B2 · kind B2 · utility

Assignee

• AZ Electronic Materials (Luxembourg) S.A.R.L. · LU

Inventors

• Hengpeng Wu
• Jian Yin · Bound Brook, US
• Guanyang Lin · Whitehouse Station, US
• Jihoon Kim · Asan-si, KR
• Jianhui Shan · Pennington, US

Key dates

• Filing date: Sep 27, 2013
• Grant date: Jul 28, 2015
• Expiry date: Sep 27, 2033

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/02282
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

Disclosed herein is a formulation for depositing a cured underlayer for promoting the formation of self assembled structures. The underlayer comprises: (a) a polymer comprising at least one pendant vinyl ether monomer repeat unit having the structure, (I):wherein R is chosen from H, C1-C4 alkyl, or halogen, and W is a divalent group chosen from C1-C6 alkylene, C6-C20 arylene, benzylene, or C2-C20 alkyleneoxyalkylene; (ii) optional thermal acid generator; and (c) a solvent. The invention also relates to processes of forming a pattern using the underlayer.