Patent · US Active

Support for use in microchannel processing

US9101890B2 · kind B2 · utility

19Cited by
85References
45Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 25, 2006
Grant dateAug 11, 2015
Priority date
Expiry dateSep 6, 2029

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P20/582
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

The disclosed technology relates to an apparatus, comprising: at least one microchannel, the microchannel comprising at least one heat transfer wall; a porous thermally conductive support in the microchannel in contact with the heat transfer wall; a catalyst or a sorption medium supported by the porous support; and a heat source and/or heat sink in thermal contact with the heat transfer wall.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.