Support for use in microchannel processing
US9101890B2 · kind B2 · utility
19Cited by
85References
45Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 25, 2006 |
| Grant date | Aug 11, 2015 |
| Priority date | — |
| Expiry date | Sep 6, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P20/582
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The disclosed technology relates to an apparatus, comprising: at least one microchannel, the microchannel comprising at least one heat transfer wall; a porous thermally conductive support in the microchannel in contact with the heat transfer wall; a catalyst or a sorption medium supported by the porous support; and a heat source and/or heat sink in thermal contact with the heat transfer wall.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.