Methods and compositions for removal of metal hardmasks
US9102901B2 · kind B2 · utility
4Cited by
5References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 6, 2013 |
| Grant date | Aug 11, 2015 |
| Priority date | — |
| Expiry date | Jul 23, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/32134
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The invention provides a process for removing a film from a substrate, said process comprising applying a composition to the film, and The invention also provides a composition comprising at least the following:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.