Photoresists containing polymer-tethered nanoparticles
US9104100B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 23, 2012 |
| Grant date | Aug 11, 2015 |
| Priority date | — |
| Expiry date | May 23, 2032 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF04C2270/0421
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Compositions such as photoresists and microfabrication processes are provided that can produce high-fidelity microfabricated structures. The provided photoresists can have reduced swelling during the development phase and can give tight tolerances for products, such as microneedles, that can be used, for example, in the medical field. The provided compositions include a photoresist, a photoinitiator system dispersed in the photoresist, and a polymer-tethered nanoparticle dispersed in the photoresist. The photoresist can be a negative photoresist and the photoinitiator system can include a two-photoinitiator system. The polymer-tethered nanoparticle can include an acrylic polymer and, in some embodiments, can include poly(methyl methacrylate). The nanoparticles can include silica.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.