Patent · US Active

Copper feature design for warpage control of substrates

US9105535B2 · kind B2 · utility

5Cited by
2References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 19, 2012
Grant dateAug 11, 2015
Priority date
Expiry dateJun 1, 2033

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/0002
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An approach is provided in which a laminate substrate includes top layers, bottom layers, and a core layer. The top layers are positioned between the core layer and a top surface metallurgy (TSM) layer and include at least one top conductive layer. The bottom layers are positioned between the core layer and a bottom surface metallurgy (BSM) layer and include at least one bottom conductive layer that includes a material void pattern that is based upon the top conductive layer and reduces warpage of the laminate substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.