Method of coating surface of substrate hole with layer of reduced graphene oxide
US9105696B1 · kind B1 · utility
9Cited by
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15Claims
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Key dates
| Filing date | Aug 4, 2014 |
| Grant date | Aug 11, 2015 |
| Priority date | — |
| Expiry date | Aug 4, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for coating a layer of reduced graphene oxide (rGO) on the surface of substrate holes (especially holes with high aspect ratio) includes a serial wet process steps of hydrophilic treatment of the surface of the substrate, self-assembly of a silane layer, steps of grafting of a polymer layer, grafting of graphene oxide (GO), intercalation of metal ions, and intercalation of metal atom/rGO intercalation. The method further includes the decoration of conductive metals (copper or nickel tungsten) plug on the rGO layer in holes by electroplating process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.