Formation of a composite pattern including a periodic pattern self-aligned to a prepattern
US9107291B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 21, 2012 |
| Grant date | Aug 11, 2015 |
| Priority date | — |
| Expiry date | May 21, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/0548
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A chemical pattern layer including an orientation control material and a prepattern material is formed over a substrate. The chemical pattern layer includes alignment-conferring features and additional masking features. A self-assembling material is applied and self-aligned over the chemical pattern layer. The polymeric block components align to the alignment-conferring features, while the alignment is not altered by the additional masking features. A first polymeric block component is removed selective to a second polymeric block component by an etch to form second polymeric block component portions having a pattern. A composite pattern of the pattern of an etch-resistant material within the chemical pattern layer and the pattern of the second polymeric block component portions can be transferred into underlying material layers employing at least another etch.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.