Patent · US Active

Photoacid generator, photoresist, coated substrate, and method of forming an electronic device

US9110369B2 · kind B2 · utility

1Cited by

17References

12Claims

0Family size

Assignee

Rohm and Haas Electronic Materials LLC · US

Inventors

Emad Aqad · Northborough, US
Irvinder Kaur · Northborough, US
Cong Liu · Lanzhou, CN
Cheng-Bai Xu · Upton, US
Mingqi Li · Sammamish, US
Gregory P. Prokopowicz · Worcester, US

Key dates

Filing date	Jun 25, 2013
Grant date	Aug 18, 2015
Priority date	—
Expiry date	Sep 20, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/20
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A photoacid generator has the formula (I):wherein R1, R2, R3, L1, L2, L3 X, Z+, a, b, c, d, p, q, and r, are defined herein. A photoresist comprises the photoacid generator, and a coated article comprises the photoresist. The photoresist can be used to form an electronic device.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.