Patent · US Active

Optical device and method of in situ treating an EUV optical component to enhance a reduced reflectivity

US9110390B2 · kind B2 · utility

0Cited by

2References

9Claims

0Family size

Assignee

KONINIKLIJKE PHILIPS N.V. · NL

Inventors

Peter Zink · Aachen, DE
Christof Metzmacher · Verviers, BE
Rolf Theo Anton Apetz · Aachen, DE

Key dates

Filing date	Jun 12, 2007
Grant date	Aug 18, 2015
Priority date	—
Expiry date	Jan 9, 2031

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C14/3492
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method of in situ treating an optical component reflecting EUV and/or soft X-ray radiation in an optical device includes providing at least one source of one or several surface materials in a vacuum chamber of the optical device where the optical component is arranged. The optical component includes one or several reflecting surfaces having a top layer of one or several surface materials. The method includes providing a source of the one or several surface materials in the chamber, and depositing surface material from the source on the one or several reflecting surfaces during operation and/or during operation-pauses of the optical device in order to cover or substitute deposited contaminant material and/or to compensate for ablated surface material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.