RF/VHF impedance matching, 4 quadrant, dual directional coupler with VRMS/IRMS responding detector circuitry
US9111725B2 · kind B2 · utility
25Cited by
1References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 11, 2014 |
| Grant date | Aug 18, 2015 |
| Priority date | — |
| Expiry date | Aug 11, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH03H7/40
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A physical vapor deposition system may include an RF generator configured to transmit an AC process signal to a physical vapor deposition chamber via an RF matching network. A detector circuit may be configured to sense the AC process signal and output a DC magnitude error signal and a DC phase error signal. A controller may be coupled to the detector circuit and the RF matching network and configured to receive the DC magnitude and phase error signals and to vary an impedance of the RF matching network in response to the DC magnitude and phase error signals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.