Patent · US Active

Floating gate structure with high electrostatic discharge performance

US9111754B2 · kind B2 · utility

5Cited by
80References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 18, 2007
Grant dateAug 18, 2015
Priority date
Expiry dateMay 25, 2028

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/0002

Abstract

Systems and methods for floating gate structures with high electrostatic discharge performance. In one embodiment, a semiconductor structure includes a floating gate device. The floating gate device includes an embedded diode characterized as having less temperature dependence than a Zener diode. The breakdown voltage of the embedded diode is greater than an operating voltage of an associated integrated circuit and a snapback trigger voltage of the embedded diode is lower than a breakdown voltage of the semiconductor structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.