Floating gate structure with high electrostatic discharge performance
US9111754B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 18, 2007 |
| Grant date | Aug 18, 2015 |
| Priority date | — |
| Expiry date | May 25, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
Abstract
Systems and methods for floating gate structures with high electrostatic discharge performance. In one embodiment, a semiconductor structure includes a floating gate device. The floating gate device includes an embedded diode characterized as having less temperature dependence than a Zener diode. The breakdown voltage of the embedded diode is greater than an operating voltage of an associated integrated circuit and a snapback trigger voltage of the embedded diode is lower than a breakdown voltage of the semiconductor structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.