Patent · US Active

System and method for generating extreme ultraviolet light

US9113540B2 · kind B2 · utility

10Cited by

4References

33Claims

0Family size

Assignee

Gigaphoton Inc. · JP

Inventors

Tsukasa HORI · Oyama, JP
Kouji Kakizaki · Hiratsuka, JP
Tatsuya Yanagida · Oyama, JP
Osamu Wakabayashi · Oyama, JP

Key dates

Filing date	Jun 8, 2012
Grant date	Aug 18, 2015
Priority date	—
Expiry date	Sep 16, 2032

Classification

Technology area (CPC H)Electricity
CPC primaryH01S3/2383
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.