Patent · US Active

Illumination system of a microlithographic projection exposure apparatus

US9116441B2 · kind B2 · utility

0Cited by

5References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Nils Dieckmann · Wertingen, DE
Manfred Maul · Aalen, DE
Christian Hettich · Konstanz, DE
Oliver Natt · Aalen, DE

Key dates

Filing date	Apr 3, 2012
Grant date	Aug 25, 2015
Priority date	—
Expiry date	Oct 20, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70191
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An illumination system of a microlithographic projection exposure apparatus can include at least one transmission filter which has a different transmittance at least at two positions and which is arranged between a pupil plane and a field plane. The transmittance distribution can be determined such that it has field dependent correcting effects on the ellipticity. In some embodiments the telecentricity and/or the irradiance uniformity is not affected by this correction.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.