Patent · US Active

Inject insert liner assemblies for chemical vapor deposition systems and methods of using same

US9117670B2 · kind B2 · utility

13Cited by
6References
23Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 14, 2013
Grant dateAug 25, 2015
Priority date
Expiry dateApr 30, 2033

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/0262
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A system for depositing a layer on a substrate includes a processing chamber, a gas injecting port for introducing gas into the system, a gas distribution plate disposed between the gas injecting port and the processing chamber, the gas distribution plate including holes therein, and an inject insert liner assembly received within the system adjacent to the gas distribution plate and upstream from the processing chamber. The inject insert liner assembly defines gas flow channels therein extending along a lengthwise direction of the system, wherein each channel includes an inlet and an outlet, and at least one channel is tapered along the lengthwise direction of the system in at least one of a vertical or horizontal direction. The inject insert liner assembly has the same number of gas flow channels as the number of holes in the gas distribution plate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.