Layout-optimized random mask distribution system and method
US9118441B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 25, 2013 |
| Grant date | Aug 25, 2015 |
| Priority date | — |
| Expiry date | Apr 7, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N7/1675
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A data processing system includes a module for generating and distributing random masks to a number of cryptographic accelerators while providing for fewer total interconnects among the components generating the random masks. The module segments the tasks associated with generating random masks across a number of modules and blocks such that routing and timing problems can be minimized and layout can be optimized. A method for generating and distributing random masks to a number of cryptographic accelerators is also provided. The random masks are utilized by cryptographic accelerators to protect secret keys, and data associated with those keys, from discovery by unauthorized users.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.