Patent · US Active

Brush cleaning system

US9119464B2 · kind B2 · utility

0Cited by

2References

20Claims

0Family size

Assignee

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. · TW

Inventors

Fu-Ming Huang · Shengang Township, TW
Liang-Guang Chen · Hsinchu, TW
Han-Hsin Kuo · Tainan, TW
Chi-Ming Tsai · New Taipei, TW
He Hui Peng · 埔鹽鄉, TW

Key dates

Filing date	Jan 31, 2012
Grant date	Sep 1, 2015
Priority date	—
Expiry date	Mar 2, 2034

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB08B6/00
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A brush cleaning system comprising: a plate comprising at least one of silicon nitride (SixNy) or silicon oxide (SiaOb), wherein the plate has a static charge on a surface thereof; and a machine configured to rotate a brush in contact with the static charged surface of the plate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.