Composition of matter and molecular resist made therefrom
US9122156B2 · kind B2 · utility
2Cited by
4References
21Claims
0Family size
Inventors
Key dates
| Filing date | Oct 21, 2014 |
| Grant date | Sep 1, 2015 |
| Priority date | — |
| Expiry date | Oct 21, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/233
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV); at least one photo acid generator; at least one crosslinker; and at least one solvent;wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.