Techniques for optimized scatterometry
US9127927B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 12, 2012 |
| Grant date | Sep 8, 2015 |
| Priority date | — |
| Expiry date | Dec 13, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG16Z99/00
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Provided are optimized scatterometry techniques for evaluating a diffracting structure. In one embodiment, a method includes computing a finite-difference derivative of a field matrix with respect to first parameters (including a geometric parameter of the diffracting structure), computing an analytic derivative of the Jones matrix with respect to the field matrix, computing a derivative of the Jones matrix with respect to the first parameters, and computing a finite-difference derivative of the Jones matrix with respect to second parameters (including a non-geometric parameter). In one embodiment, a method includes generating a transfer matrix having Taylor Series approximations for elements, and decomposing the field matrix into two or more smaller matrices based on symmetry between the incident light and the diffracting structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.