Photolithographic methods

US9128379B2 · kind B2 · utility

Assignee

• Rohm and Haas Electronic Materials LLC · US

Inventors

• Young Cheol Bae · Weston, US
• Rosemary Bell · Wayland, US
• Jong Keun Park · Hudson, US
• Seung Hyun Lee · Seojong-myeon, KR

Key dates

• Filing date: Mar 30, 2014
• Grant date: Sep 8, 2015
• Expiry date: Mar 30, 2034

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/3081
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.