Extreme ultraviolet light generation apparatus and control method for laser apparatus in extreme ultraviolet light generation system
US9131589B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 29, 2014 |
| Grant date | Sep 8, 2015 |
| Priority date | — |
| Expiry date | May 29, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2316
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An extreme ultraviolet light generation apparatus may include a chamber containing a plasma generation region irradiated by a pulse laser beam from a laser apparatus, a target supply device configured to supply a plurality of targets consecutively to the plasma generation region in the chamber, a target detection unit configured to detect a target outputted from the target supply device, and a laser controller configured to control the laser apparatus; the laser controller generating a light emission trigger instructing a laser device included in the laser apparatus to emit a pulse laser beam, and outputting the generated light emission trigger to the laser apparatus, in accordance with a detection signal from the target detection unit; and the laser controller adjusting generation of the light emission trigger outputted consecutively to the laser apparatus so that a time interval of the light emission trigger is within a predetermined range.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.