Patent · US Active

Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus

US9134504B2 · kind B2 · utility

1Cited by

4References

23Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Timo Laufer · Stuttgart, DE
Alexander Sauerhoefer · Hamburg, DE

Key dates

Filing date	Feb 10, 2012
Grant date	Sep 15, 2015
Priority date	—
Expiry date	Jan 27, 2034

Classification

Technology area (CPC G)Physics
CPC primaryG02B7/1815
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

An optical arrangement in an optical system, such as a microlithographic projection exposure apparatus, includes: at least one heat-emitting subsystem which emits heat during the operation of the optical system; a first heat shield which is arranged such that it at least partly absorbs the heat emitted by the heat-emitting subsystem; a first cooling device which is in mechanical contact with the first heat shield and is designed to dissipate heat from the first heat shield; and a second heat shield which at least partly absorbs heat emitted by the first heat shield. The second heat shield is in mechanical contact with a cooling device that dissipates heat from the second heat shield.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.