Closed drift magnetic field ion source apparatus containing self-cleaning anode and a process for substrate modification therewith
US9136086B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 8, 2009 |
| Grant date | Sep 15, 2015 |
| Priority date | — |
| Expiry date | Jan 17, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/081
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A process for modifying a surface of a substrate is provided that includes supplying electrons to an electrically isolated anode electrode of a closed drift ion source. The anode electrode has an anode electrode charge bias that is positive while other components of the closed drift ion source are electrically grounded or support an electrical float voltage. The electrons encounter a closed drift magnetic field that induces ion formation. Anode contamination is prevented by switching the electrode charge bias to negative in the presence of a gas, a plasma is generated proximal to the anode electrode to clean deposited contaminants from the anode electrode. The electrode charge bias is then returned to positive in the presence of a repeat electron source to induce repeat ion formation to again modify the surface of the substrate. An apparatus for modification of a surface of a substrate by this process is provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.