Process for manufacturing electro-mechanical systems
US9139425B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 7, 2010 |
| Grant date | Sep 22, 2015 |
| Priority date | — |
| Expiry date | Dec 7, 2030 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C1/00936
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method of avoiding stiction during vapor hydrofluoride (VHF) release of a microelectromechanical system (MEMS) or nanoelectromechanical system (NEMS) composed of a mechanical device and a substrate is described. A silicon nitride layer is provided between the substrate and a sacrificial oxide layer and/or between a device layer and the sacrificial oxide layer, and/or on a side of the device layer facing away from the sacrificial oxide layer, and converted to thicker ammonium hexafluorosilicate with VHF while simultaneously removing a portion of the sacrificial oxide. The ammonium hexafluorosilicate acts as a temporary support, shim, wedge, or tether which limits device movement during fabrication and is later removed by sublimation under heat and/or reduced pressure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.