Patent assignee · GB · COMPANY

SPTS Technologies Limited

76Patents
76Active
76Granted
55Portfolio score

Filing activity: Feb 22, 2006 → Sep 24, 2023 · 4 expiring within 5 years

Most-cited patents

PatentTitleAreaCited byStatus
US9139425B2 Process for manufacturing electro-mechanical systems Performing Operations; Transporting 90 Active
US9207139B2 Mass flow control monitoring Physics 14 Active
US9725805B2 Apparatus and method for controlled application of reactive vapors to produce thin films and coatings Performing Operations; Transporting 8 Active
US10283381B2 Apparatus for plasma dicing Electricity 3 Active
US8454805B2 Method of depositing amorphus aluminium oxynitride layer by reactive sputtering of an aluminium target in a nitrogen/oxygen atmosphere Chemistry; Metallurgy 2 Active
US10079150B2 Method and apparatus for dry gas phase chemically etching a structure Electricity 2 Active
US9972583B2 Durable, heat-resistant multi-layer coatings and coated articles Electricity 1 Active
US11802341B2 PE-CVD apparatus and method Electricity 1 Active
US10622193B2 Plasma etching apparatus Electricity 1 Active
US9719166B2 Method of supporting a workpiece during physical vapour deposition Electricity 1 Active
US8709268B2 Etching apparatus and methods Performing Operations; Transporting 1 Active
US11545394B2 Semiconductor wafer dicing process Electricity 1 Active
US10062576B2 Method for plasma etching a workpiece Electricity 1 Active
US9640370B2 Etching apparatus and methods Performing Operations; Transporting 1 Active
US11127568B2 Plasma etching apparatus Electricity 1 Active
US9048066B2 Method of etching Electricity 1 Active
US9165762B2 Method of depositing silicone dioxide films Electricity 1 Active
US11189463B2 Plasma generating arrangement Electricity 1 Active
US11710670B2 Apparatus and method Electricity 1 Active
US9728432B2 Method of degassing Electricity 1 Active
US9159599B2 Apparatus for chemically etching a workpiece Electricity 1 Active
US9601341B2 Method of etching Electricity 1 Active
US9903039B2 Electrochemical deposition chamber Chemistry; Metallurgy 0 Active
US12334353B2 Method and apparatus for plasma etching Electricity 0 Active
US12362152B2 Plasma etching apparatus and method Electricity 0 Active

Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.