Patent · US Active

EUV pellicle frame with holes and method of forming

US9140975B2 · kind B2 · utility

1Cited by

1References

16Claims

0Family size

Assignee

GlobalFoundries Inc. · KY

Inventors

Lei Sun · Beijing, CN
Chanro Park · Clifton Park, US
Wenhui Wang · Clifton Park, US
Hui Zang · Guilderland, US

Key dates

Filing date	Dec 13, 2013
Grant date	Sep 22, 2015
Priority date	—
Expiry date	Jan 1, 2034

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/64
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method of forming an improved EUV mask and pellicle with airflow between the area enclosed by the mask and pellicle and the area outside the mask and pellicle and the resulting device are disclosed. Embodiments include forming a frame around a patterned area on an EUV mask; forming a membrane over the frame; and forming holes in the frame.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.