Photosensitive organic particles
US9140989B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 11, 2012 |
| Grant date | Sep 22, 2015 |
| Priority date | — |
| Expiry date | Apr 11, 2032 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F220/58
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A material forms a pattern by applying a photosensitive composition to a base material and drying to form a photosensitive coating and performing exposure and development, and a method for forming the pattern. A photosensitive composition includes water-soluble organic particles, and a solvent, wherein the solvent is a poor solvent for the water-soluble organic particles. Preferably, the water-soluble organic particles of the photosensitive composition includes a polymer which contains a unit structure (A) for forming organic particles, a unit structure (B) for forming interparticle crosslinkage, and a unit structure (C) for imparting dispersibility, and the photosensitive composition further includes a photoacid generator. In addition, the water-soluble organic particles of the photosensitive composition includes a polymer which contains the unit structure (A) for forming organic particles, the unit structure (B) for forming interparticle crosslinkage, the unit structure (C) for imparting dispersibility, and a unit structure (D) having a photoacid generating group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.