Yuki Usui
17Patents
1h-index
45Co-inventors
50Inventor score
Filing activity: Jun 17, 2010 → Oct 14, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9023583B2 | Monolayer or multilayer forming composition | Chemistry; Metallurgy | 1 | Active |
| US9101158B2 | Application of soybean emulsion composition to soybean-derived raw material-containing food or beverage | Human Necessities | 1 | Active |
| US9514949B2 | Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structure | Physics | 1 | Active |
| US8685615B2 | Photosensitive resist underlayer film forming composition | Physics | 1 | Active |
| US10437151B2 | Cationically polymerizable resist underlayer film-forming composition | Physics | 1 | Active |
| US9678427B2 | Resist underlayer film-forming composition containing copolymer that has triazine ring and sulfur atom in main chain | Physics | 1 | Active |
| US9793131B2 | Pattern forming method using resist underlayer film | Chemistry; Metallurgy | 1 | Active |
| US11131928B2 | Resist underlayer film forming composition which contains compound having glycoluril skeleton as additive | Physics | 0 | Active |
| US9340561B2 | Organic silicon compound and silane coupling agent containing the same | Human Necessities | 0 | Active |
| US9822330B2 | Light-degradable material, substrate, and method for patterning the substrate | Emerging Cross-Sectional Technologies | 0 | Active |
| US9320602B2 | Compressed fiber structural material and method for producing the same | Human Necessities | 0 | Active |
| US11655273B2 | Substrates coated with selective cell separation or cell culture polymers | Chemistry; Metallurgy | 0 | Active |
| US11319514B2 | Composition for forming a coating film for removing foreign matters | Emerging Cross-Sectional Technologies | 0 | Active |
| US11542366B2 | Composition for forming resist underlayer film and method for forming resist pattern using same | Electricity | 0 | Active |
| US9140989B2 | Photosensitive organic particles | Chemistry; Metallurgy | 0 | Active |
| US11003078B2 | Compositions for forming a protective film against basic aqueous hydrogen peroxide solution, and pattern formation method | Electricity | 0 | Active |
| US10844167B2 | Composition for forming resist underlayer film and method for forming resist pattern using same | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.