Patent · US Active

EUV mask

US9146458B2 · kind B2 · utility

0Cited by

1References

5Claims

0Family size

Assignee

Kabushiki Kaisha Toshiba · JP

Inventors

Yoshinori Hagio · Somalomo, CM
Yosuke Okamoto · Yokohama, JP

Key dates

Filing date	Mar 13, 2013
Grant date	Sep 29, 2015
Priority date	—
Expiry date	Sep 28, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/7085
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An EUV exposure apparatus according to embodiments includes a reticle stage which suctions a rear surface side of an EUV mask to retain the EUV mask. In addition, the EUV exposure apparatus includes a detection unit which detects a position of a measurement mark formed on the rear surface of the EUV mask in the state where the EUV mask is suctioned on the reticle stage. In addition, the EUV exposure apparatus includes a control unit which calculates a distortion amount of the EUV mask based on the position of the measurement mark and performs exposure control on a wafer while correcting the distortion amount.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.