Resistor and fabrication method thereof
US9147678B2 · kind B2 · utility
0Cited by
1References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 4, 2012 |
| Grant date | Sep 29, 2015 |
| Priority date | — |
| Expiry date | Aug 1, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D1/474
Abstract
The present invention provides a structure of a resistor comprising: a substrate having an interfacial layer thereon; a resistor trench formed in the interfacial layer; at least a work function metal layer covering the surface of the resistor trench; at least two metal bulks located at two ends of the resistor trench and adjacent to the work function metal layer; and a filler formed between the two metal bulks inside the resistor trench, wherein the metal bulks are direct in contact with the filler.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.