Method of making molybdenum containing targets comprising molybdenum, titanium, and tantalum or chromium
US9150955B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 5, 2013 |
| Grant date | Oct 6, 2015 |
| Priority date | — |
| Expiry date | Aug 29, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31678
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention relates to sputter targets and methods for depositing a layer from a sputter target. The method preferably includes the steps of; placing a sputter target in a vacuum chamber; placing a substrate having a substrate surface in the vacuum chamber; reducing the pressure in the vacuum chamber to about 100 Torr or less; removing atoms from the surface of the sputter target white the sputter target is in the vacuum chamber (e.g., using a magnetic field and/or an electric field). The deposited layer preferably includes a molybdenum containing alloy including about 50 atomic percent or more molybdenum, 0.1 to 45 atomic percent titanium; and 0.1 to 40 atomic percent of a third metal element that is tantalum or chromium.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.