Gas delivery for beam processing systems
US9150961B2 · kind B2 · utility
3Cited by
22References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 16, 2010 |
| Grant date | Oct 6, 2015 |
| Priority date | — |
| Expiry date | Jun 16, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/006
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Gas flow from multiple gas sources into a sample chamber of a beam system is controlled by a cycling valve for each gas source, with the gas pressure in the sample chamber being determined by the relative time that the valve is opened and the upstream pressure at the valve. A gas valve positioned inside the vacuum chamber allows rapid response in shutting off a gas. In some preferred embodiments, a precursor gas is supplied from a solid or liquid material in a container that remains outside the vacuum system while in use and which is readily connected or disconnected to the gas injection system without significant leakage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.