Patent · US Active

Patterning nano-scale patterns on a film comprising unzipping copolymers

US9164376B2 · kind B2 · utility

0Cited by
9References
17Claims
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Key dates

Filing dateAug 9, 2012
Grant dateOct 20, 2015
Priority date
Expiry dateMay 11, 2034

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24355
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

The invention concerns a method for patterning a surface of a material. A substrate having a polymer film thereon is provided. The polymer is a selectively reactive polymer (e.g., thermodynamically unstable): it is able to unzip upon suitable stimulation. A probe is used to create patterns on the film. During the patterning, the film is locally stimulated for unzipping polymer chains. Hence, a basic idea is to provide a stimulus to the polymeric material, which in turn spontaneously decomposes e.g., into volatile constituents. For example, the film is thermally stimulated in order to break a single bond in a polymer chain, which is sufficient to trigger the decomposition of the entire polymer chain.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.