Temperature control in EUV reticle inspection tool
US9164388B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 5, 2013 |
| Grant date | Oct 20, 2015 |
| Priority date | — |
| Expiry date | Jan 17, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/22
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus comprises an optics assembly and a plate. The optics assembly configured to focus light from an EUV source onto a reticle or sensor. The plate has an opening to allow the EUV light to pass through disposed between the optics assembly and the reticle or sensor. The plate is cooled to a temperature less than that of the reticle or sensor. The plate is engineered to balance out heat absorbed from the reticle or sensor with heat absorbed by the plate. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.