Target point generation for optical proximity correction
US9165095B2 · kind B2 · utility
3Cited by
3References
20Claims
0Family size
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Key dates
| Filing date | Nov 15, 2013 |
| Grant date | Oct 20, 2015 |
| Priority date | — |
| Expiry date | Nov 15, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70441
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method performed by a computer processing system includes receiving a design pattern for an integrated circuit, applying a function to the design pattern to generate a model contour, generating a plurality of Optical Proximity Correction (OPC) target points along the model contour, adjusting the design pattern to create an adjusted pattern, and performing a simulation on the adjusted pattern to create a simulated contour.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.