Patent · US Active

Alignment mark definer

US9165889B2 · kind B2 · utility

0Cited by

11References

23Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Joerg Ortner · Finkenstein, AT
Josef Campidell · Villach, AT
Andreas Greiner · Amöneburg, DE

Key dates

Filing date	Jun 28, 2013
Grant date	Oct 20, 2015
Priority date	—
Expiry date	Jan 2, 2034

Classification

Technology area (CPC H)Electricity
CPC primaryH01L2924/0002
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

An alignment mark definer is configured to provide a geometrical definition for an actual alignment structure to be formed at a temporary surface of a substrate based on a desired appearance of the alignment mark and on an expected alteration of an appearance of the actual alignment structure caused by a deposition material deposited on the temporary surface and the actual alignment structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.