Atomically precise surface engineering for producing imagers

US9165971B2 · kind B2 · utility

Assignee

• CALIFORNIA INSTITUTE OF TECHNOLOGY · US

Inventors

• Frank Greer · Pasadena, US
• Todd J. Jones · Altadena, US
• Shouleh Nikzad · Valencia, US
• Michael E. Hoenk · Pasadena, US

Key dates

• Filing date: Oct 25, 2011
• Grant date: Oct 20, 2015
• Expiry date: Oct 25, 2031

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10F39/805

Abstract

High-quality surface coatings, and techniques combining the atomic precision of molecular beam epitaxy and atomic layer deposition, to fabricate such high-quality surface coatings are provided. The coatings made in accordance with the techniques set forth by the invention are shown to be capable of forming silicon CCD detectors that demonstrate world record detector quantum efficiency (>50%) in the near and far ultraviolet (155 nm-300 nm). The surface engineering approaches used demonstrate the robustness of detector performance that is obtained by achieving atomic level precision at all steps in the coating fabrication process. As proof of concept, the characterization, materials, and exemplary devices produced are presented along with a comparison to other approaches.