Method and apparatus for detecting arc in plasma chamber
US9170295B2 · kind B2 · utility
5Cited by
12References
10Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 27, 2013 |
| Grant date | Oct 27, 2015 |
| Priority date | — |
| Expiry date | Jul 29, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R27/08
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus for detecting an arc in a plasma chamber is designed to detect the respective voltage and current values of RF power supplied to the plasma chamber and calculate the ratio of the voltage and current values to accomplish a required control of the supplying of the power. When it is determined that the arc is generated, the apparatus rapidly controls the supplying of the power to prevent damages on the plasma chamber and contaminations on the materials to be processed due to the generation of the arc.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.