Range pattern matching in mask data
US9171126B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 25, 2014 |
| Grant date | Oct 27, 2015 |
| Priority date | — |
| Expiry date | Mar 25, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/68
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Pattern matching technology is used to find locations in mask data that are available for later processes, such as marking. These locations are found using pattern definitions. A match algorithm outputs locations that match the pattern definitions. Each pattern definition may include multiple marks. The patterns can be symmetrical or asymmetrical and the marks can be correctly placed during a marking step by using orientation information determined during the pattern matching process. Large area geometries may be located by a two-step process that generates a pattern definition by defining smaller patterns therein and by defining the spatial relationships of the smaller patterns. An additional correlation step results in high accuracy while minimizing computing resources.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.