Method for producing an integrated imaging device with front face illumination comprising at least one metal optical filter, and corresponding device

US9171973B2 · kind B2 · utility

Assignees

• STMicroelectronics (Crolles 2) SAS · FR
• STMicroelectronics SA
• COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES · FR

Inventors

• Romain Girard Desprolet · Grenoble, FR
• Sandrine Lhostis · Theys, FR
• Salim Boutami · Grenoble, FR
• Michel Marty · Buc, FR

Key dates

• Filing date: Dec 3, 2014
• Grant date: Oct 27, 2015
• Expiry date: Dec 3, 2034

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10F77/413
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An integrated imaging device supports front face illumination with one or more photosensitive regions formed in a substrate. A lower dielectric region is provided over the substrate, the lower dielectric region having an upper face. A metal optical filter having a metal pattern is provided on the upper face (or extending into the lower dielectric region from the upper face). An upper dielectric region is provided on top of the lower dielectric region and metal optical filter. The lower dielectric region is at least part of a pre-metal dielectric layer, and the upper dielectric region is at least part of a metallization layer.