Methods for fabricating three-dimensional nano-scale structures and devices
US9177817B2 · kind B2 · utility
1Cited by
5References
38Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 21, 2012 |
| Grant date | Nov 3, 2015 |
| Priority date | — |
| Expiry date | Aug 21, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0277
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of fabricating a 3 dimensional structure, includes: forming a stack of at least 2 layers of photo resist material having different photo resist sensitivities upon a substrate; exposing the stack to beams of electromagnetic radiation or charged particles of different dosages to achieve selective solubility along a height of the stack; and dissolving soluble portions of the stack with a solvent to produce a 3 dimensional structure of desired geometry.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.