Patent · US Active

Underlayer composition for promoting self assembly and method of making and using

US9181449B2 · kind B2 · utility

4Cited by

27References

20Claims

0Family size

Assignee

AZ Electronic Materials (Luxembourg) S.A.R.L. · LU

Inventors

Yi Yi · Bloomington, US
Jian Yin · Bound Brook, US
Guanyang Lin · Whitehouse Station, US

Key dates

Filing date	Dec 16, 2013
Grant date	Nov 10, 2015
Priority date	—
Expiry date	Jan 31, 2034

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/168
WIPO fieldBasic materials chemistry
WIPO sectorChemistry

Abstract

Disclosed herein is an underlayer composition, wherein the underlayer is typically used for promoting the formation of self assembled structures, and wherein the underlayer formulation comprises: (a) a polymer comprising at least one monomer repeat unit having the structure (I)wherein X is a crosslinking group chosen fromand wherein n is 0-5, p is 0-5, q is 1-2, m is 1-2 and R is H, C1-C4alkyl or tri(C1-C4alkyl)silyl; (b) at least one thermal acid generator; and (c) a solvent. The invention further relates to methods of making and using the composition.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.