Patent · US Active

Semiconductor wafer inspection system and method

US9182357B2 · kind B2 · utility

0Cited by

1References

22Claims

0Family size

Assignee

Nanda Technologies GmbH · DE

Inventors

Lars Markwort · Haimhausen, DE
Ernst Hegels · Munich, DE

Key dates

Filing date	Dec 23, 2010
Grant date	Nov 10, 2015
Priority date	—
Expiry date	Mar 10, 2033

Classification

Technology area (CPC H)Electricity
CPC primaryH01L2924/0002
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A wafer inspection system comprises a camera having a field of view, an object mount configured to position at least a portion of surface 5 of an object 3 at an object plane 15 relative to the camera and within the field of view of the camera and at least one surface portion 41 carrying a multitude of retroreflectors 95 disposed at a greater Δd distance from the camera than the object plane and within the field of view of the camera.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.