Patent · US Active

Photoresist composition

US9182663B2 · kind B2 · utility

1Cited by
5References
10Claims
0Family size

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Inventors

Key dates

Filing dateMay 28, 2013
Grant dateNov 10, 2015
Priority date—
Expiry dateMay 28, 2033

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/38
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A photoresist composition comprising: wherein the ring W1 is a nitrogen-containing heterocyclic ring, or a benzene ring having a substituted or unsubstituted amino group,

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.