Detecting defects on a wafer with run time use of design data
US9183624B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 13, 2014 |
| Grant date | Nov 10, 2015 |
| Priority date | — |
| Expiry date | Jun 13, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Methods and systems for detecting defects on a wafer are provided. One method includes creating a searchable database for a design for a wafer, which includes assigning values to different portions of the design based on patterns in the different portions of the design and storing the assigned values in the searchable database. Different portions of the design having substantially the same patterns are assigned the same values in the searchable database. The searchable database is configured such that searching of the database can be synchronized with generation of output for the wafer by one or more detectors of a wafer inspection system. Therefore, as the wafer is being scanned, design information for the output can be determined as fast as the output is generated, which enables multiple, desirable design based inspection capabilities.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.