Method of determining overlay error and control system for dynamic control of reticle position
US9188876B2 · kind B2 · utility
1Cited by
5References
20Claims
0Family size
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Key dates
| Filing date | Feb 7, 2012 |
| Grant date | Nov 17, 2015 |
| Priority date | — |
| Expiry date | Jun 25, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/44
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of determining overlay error. The method includes transferring a pattern from a reticle to a wafer and selecting a first set of data points to measure the positional difference between features on the reticle and features on the wafer. The method also includes determining a second set of data points characteristic of the first set of data points but containing fewer data points. A control system for using the second set of data points to dynamically adjust the position of the reticle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.